Microelectronics Water Treatment
Nuvonic TOCLine™ systems are engineered to deliver ultra-low Total Organic Carbon (TOC) levels in the most demanding ultrapure water (UPW) applications, helping semiconductor manufacturers protect wafer yield, process stability, and product quality. Designed specifically for advanced UPW make up and polishing loops, TOCLine systems combine proven UV oxidation technology with Nuvonic’s unique capability to design and manufacture its own UV lamps, electronic monitors, and core system components in-house. This vertically integrated approach provides exceptional process control, product reliability, and long-term performance. With proven installations supporting sub-1 ppb TOC requirements and a wide global installed base, TOCLine is a trusted solution for fabs seeking high-performance TOC reduction, reduced operating costs, and expert lifecycle support.
Maximise Yields With Precision UV Technology
As chipmakers push toward smaller, more advanced manufacturing processes, UPW quality is an increasingly critical determinant of wafer yield and process stability. Nuvonic’s SuperTOCTM UV lamps generate high-intensity 185nm UV which splits water molecules into highly reactive hydroxyl radicals. These radicals break down trace organic contaminants, helping meet the sub-ppb TOC targets required in leading-edge fabs.
Support you can rely on
Backed by decades of experience in semiconductor facilities worldwide, world-class after-sales support and a rock-solid spares supply chain, whether you’re managing existing facilities or planning new ones, we’ll help you achieve and maintain the water purity your production processes demand.
